Two-Step Fluorescent Particle Inspection Device for Semiconductor Manufacture [Patent]

Lumos Technology Co., Ltd. partnered with a leading semiconductor manufacturer to produce a pair of devices for particle inspection and removal—processes critical to semiconductor manufacture, where wafer cleanliness is of paramount concern. The invention includes a light source for sticky particle identification, alongside a particle removal device that protects wafers from damaging scratches.

To aid identification, Hiro proposed using a low-angle, collimated inspection light, which can provide valuable contrast and trigger fluorescent glow. For particle removal, he proposed 1) dislodging dust with controlled bursts of air and 2) simultaneously vacuuming, thereby avoiding any potential dragging of dust on the wafer surface.